KRI Hall Ion Source eH 400, Etazini

BertonKRIHall Ion SourceeH 400Features:

1.Anode component ye lëu bɛ̈n tɔ̈ɔ̈u-Easy maintenance;Loktu Maintenance,Lɔ̈k tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n tɛ̈n;Plug-and-use anode ye kɔ̈k

2.High discharge current ye cɔl broad beam-Yɛl etching rate;Efisiensi gravure;High-ion ye kony coatingIADEfisiensi

3.Kuen juëc-Applied toLoad lock /Ultra High Vacuum System

4.Plasma ye kɛ̈ɛ̈r ye kɛ̈ɛ̈r ye kɛ̈ɛ̈r ye kɛ̈ɛ̈r ye kɛ̈ɛ̈r